Laurell Spin Coater (Manual). Equipment used mainly for coating thin layers of PDMS. It can process wafer from 2”- 6” diameter and small wafer fragments or Two manual spinners are used for spin coating photoresist onto wafers. high uniformity across the substrate, and conformal depositions. 18) Laurell Technology spin coaters with fragment adaptors 19) Leica DM2500M microscope 20) Micromanipulator 450PM-B manual probe stationDESCRIPTION. Spin coater (LAMDA-P). What is the spin coating?. Spin coating is a procedure used to deposit uniform thin films to flat substrates . This manual spinner has a new controller, the Headway model PWM32, which allows a bit of programming similar to our new CEE spinner. We can use the Headway for Spin Coater. Spin coating involves accurately dispensing a liquid onto a substrate and then spinning to achieve a uniform film. Info.